Ion Chambers For Semiconductor Equipment

Manufacturing of semiconductor devices relies doping the material with specific atoms by ion implantation equipment. Ion implantation requires reactive gasses and high temperatures and our porous tungsten arc chambers assure mechanical and thermal resilience under the harsh process conditions.

Spectra-Mat has been machining ion chambers out of 85% porous tungsten, from high purity raw material, insuring no contamination in the process gasses. The unique capabilities to machine porous tungsten are used to supply machined ion chamber, arc slits, repellers and pins for ion implantation equipment.

• Excellent high temperature resistance, hardness and thermal conductivity.
• No outgassing
• Resistant to corrosion by several minerals acids, high reactive gasses and liquied metals.
• High purity materials
• High tolerance machined parts
• Proven long life in highly reactive plasma environment.